High-NA Imaging Cell
- Flatness < λ/4 per 10 mm aperture
- Face parallelism < 1 arcminute
- AR-coated or uncoated
- DN16 or DN40 CF flange
Bakeout
up to 300 °C
High optical flatness and precise face parallelism help minimize distortion through the cell. The high-NA design supports imaging or light projection through two faces at numerical apertures up to 0.7.
High-NA cells are optically matched to readily available 0.3, 0.5, and 0.7 NA microscope objectives.
Targeted AR for K, Rb, Cs, Na, and 1,064 nm
Broadband IBS AR coatings from 450 to 1,070 nm
Uncoated and custom coating options
Product Options
Three configurations cover high-NA imaging, AR-coated optical access, and economical thin-wall operation. Each is UHV compatible, bakeable to 300 °C, and assembled without epoxy or frits.
Download Data Sheets
Bakeout
up to 300 °C
Bakeout
up to 300 °C
Bakeout
up to 300 °C
Comparison
Compare geometry, flatness, and coatings.
| Criterion | High-NA | AR-coated | Thin-walled |
|---|---|---|---|
| Internal size | 10 × 13 × 60 mm | 20 × 20 × 60 mm | 20 × 20 × 65 mm |
| Wall | 3.5 ± 0.05 mm | 3 ± 0.05 mm | 1.5 ± 0.2 mm |
| Flatness | < λ/4 at 10 mm | < λ/2 at 10 mm | < 2-4 λ at 10 mm |
| Coating | Standard/custom | Standard/custom | Uncoated |
| CF flange | DN16 or DN40 | DN16 or DN40 | DN16 or DN40 |
| Bakeout | Up to 300 °C | Up to 300 °C | Up to 300 °C |
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